Product Profile of Industrial Wafer/ Mask Cleaner Unit
Industrial Wafer/ Mask Cleaner Unit is designed for damage-free mega sonic and chemical cleaning applications. The Wafer/ Mask Cleaner Unit enables cleaning of the diced chips on wafer frame and after plasma etching or photo resist stripping. The Wafer/ Mask Cleaner Unit enables Mega sonic agitation to enhance lift-off process. The Industrial Wafer/ Mask Cleaner Unit also facilitates patterned or un-patterned wafer cleaning.
Applications of the Industrial Wafer/ Mask Cleaner Unit:
Patterned or Un-patterned Wafer Cleaning
Ge, GaAs and InP Wafer Cleaning
Post CMP Wafer Cleaning
Cleaning of the Diced Chips on Wafer Frame
Cleaning after Plasma Etching or Photo resist Stripping
Cleaning after Lapping and prior to Bonding
Cleaning of X-ray Masks, EUV Masks, Templates
Pelliclized Reticle Cleaning
Cleaning of Mask Blanks
Cleaning Contact Masks
Cleaning of the ITO coated Display Panels
Cleaning of Ceramic Substrates with laser drilled holes
Optical Lens Cleaning
Mega sonic agitation to enhance Lift-off Process
